plasmaimmersionionimplantation

由JVMantese著作·1996·被引用122次—Plasma-immersionionimplantation(PIII)isanemergingtechnologyforthesurfaceengineeringofsemiconductors,metals,anddielectrics.,由FTorregrosa著作·2018·被引用1次—...Implantation(orPlasmaDoping)hasbeenwidelyusedforMemorydevicefabrication.Itsabilitytoimplantveryhighdosesinshallowlayers,makesita ...,由SGuo著作·2020·被引用12次—Plasmaimmersionionimplantation(PIII)isaviabl...

參考資訊如下
Plasma-Immersion Ion Implantation

由 JV Mantese 著作 · 1996 · 被引用 122 次 — Plasma-immersion ion implantation (PIII) is an emerging technology for the surface engineering of semiconductors, metals, and dielectrics.

Advantages and Challenges of Plasma Immersion Ion ...

由 F Torregrosa 著作 · 2018 · 被引用 1 次 — ... Implantation (or Plasma Doping) has been widely used for Memory device fabrication. Its ability to implant very high doses in shallow layers, makes it a ...

Effects of carbon and nitrogen plasma immersion ion ...

由 S Guo 著作 · 2020 · 被引用 12 次 — Plasma immersion ion implantation (PIII) is a viable surface modification method which can change the surface microstructure and chemical ...

An effective method to optimise plasma immersion ion ...

由 Y Chen 著作 · 2022 · 被引用 5 次 — Plasma immersion ion implantation (PIII) is one of the commonly used methods to treat polymer surfaces to achieve biocompatibility. The ...

(Invited) Plasma Immersion Ion Implantation

Plasma

Plasma-immersion ion implantation (PIII) or pulsed-plasma doping (pulsed PIII) is a surface modification technique of extracting the accelerated ions from ...